Nanotech R&D requires versatile and flexible instruments. State of the art performances, multi user management, instrument reliability and ease of operation are the critical requirements. Automation is mandatory for small batch applications.
RAITH150-TWO is Raith's highly automated E-beam writer for long-lasting and large area exposures. It ideally suits nanotechnology research centres and industry labs.
e_LiNE plus is a versatile electron beam lithography and nanoengineering workstation having complied with the specific requirements of interdisciplinary research at universities.
ionLiNE is the first three-dimensional lithography system in the world. 2D EBL functionality has been extended to provide true 3D patterning capability.
PIONEER is the ideal hybrid for both high resolution electron beam lithography and imaging in university institutes.
traxx and periodixx enable zero lithography to write extended waveguide or repetitive photonic crystal style pattern without any stitching error.
The Raith company offers innovative solutions for lithography and nanoengineering. Raith gained experience in the field of micro- and nanotechnology since more than 25 years. Raith would be happy to assist you with further information and consultation in questions of lithography and nanoengineering.
